Sc-doped GeTe thin films prepared by radio-frequency magnetron sputtering

Logo poskytovatele

Varování

Publikace nespadá pod Ústav výpočetní techniky, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
Autoři

BOUŠKA Marek GUTWIRTH Jan BEČVÁŘ Kamil KUCEK Vladimír ŠLANG Stanislav JANÍČEK Petr PROKEŠ Lubomír HAVEL Josef NAZABAL Virginie NĚMEC Petr

Rok publikování 2025
Druh Článek v odborném periodiku
Časopis / Zdroj Scientific Reports
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://www.nature.com/articles/s41598-024-84963-3
Doi https://doi.org/10.1038/s41598-024-84963-3
Klíčová slova Phase change materials; Scandium doping; Germanium telluride; Thin films
Popis Radio frequency magnetron co-sputtering method employing GeTe and Sc targets was exploited for the deposition of Sc doped GeTe thin films. Different characterization techniques (scanning electron microscopy with energy-dispersive X-ray analysis, X-ray diffraction, atomic force microscopy, sheet resistance temperature-dependent measurements, variable angle spectroscopic ellipsometry, and laser ablation time-of-flight mass spectrometry) were used to evaluate the properties of as-deposited (amorphous) and annealed (crystalline) Ge-Te-Sc thin films. Prepared amorphous thin films have Ge48Te52, Ge46Te50Sc4, Ge44Te48Sc8, Ge43Te47Sc10 and Ge41Te45Sc14 chemical composition. The crystallization temperatures were found in the region of ~?153–272 °C and they increase with scandium content. Upon amorphous-crystalline material phase change, large changes in sheet resistance were measured, with electrical contrast in terms of sheet resistance ratio Rannealed/Ras-deposited in the range of 1.37.10-4 – 9.1.10-7. Simultaneously, huge variations of optical functions were found as demonstrated by absolute values of optical contrast values (at 405 nm) in the range of |?n|+|?k| = 1.88–3.75 reaching maximum for layer containing 8 at% of Sc.
Související projekty:

Používáte starou verzi internetového prohlížeče. Doporučujeme aktualizovat Váš prohlížeč na nejnovější verzi.

Další info