Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses

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Authors	GROZA A. SURMEIAN A. DIPLASU C. TEMPEZ A. CHAPON P. LOBO L. BORDEL L. SCHMIDTOVÁ Tereza VAŠINA Petr BELENGUER P. NELIS T. GUILLOT P. TUCCITO N. LICCIARDELLO A.
Year of publication	2008
Type	Article in Proceedings
Conference	Book of Abstracts, Second Central European Symposium on Plasma Chemistry
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	depth profiles; TOF spectrometry
Description	Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses, proceeding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface