Structure and properties of DLC/SiOx films deposited in CW and pulsed plasma

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	GRANIER A. BEGOU T. DUQUENNE C. DJOUADI M.A. FENG X. BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka
Year of publication	2007
Type	Article in Proceedings
Conference	18th International Symposium on Plasma Chemistry, Abstracts and Full-Papers CD
MU Faculty or unit	Faculty of Science
Citation
Field	Solid matter physics and magnetism
Keywords	DLC;PECVD;HMDSO;mechanical properties
Description	Structure and properties of DLC/SiOx films deposited in CW and pulsed plasma
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Multiscale approach to relationships between mechanical and microstructural characteristics of materials Nanometrologie využívající metod rastrovací sondové mikroskopie