Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma

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Authors	DE POUSQUES Ludovic IMBERT Jean-Christiphe VAŠINA Petr BOISSE-LAPORTE Caroline TEULE-GAY Lionel TOUZEAU Michel
Year of publication	2004
Type	Article in Proceedings
Conference	Prosseding of Ninth International Conference on Plasma Surface Engineering
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	IPVD; microwave; RF; magnetron
Description	The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system
Related projects:	Pokročilé směry ve fyzice a chemii plazmatu Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates