Deposition of DLC:Si(O) Films in Low Pressure Discharges

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Authors	ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma PEŘINA Vratislav MACKOVÁ Anna JANČA Jan
Year of publication	2001
Type	Article in Proceedings
Conference	Proceedings of 13th Symposium on Application of Plasma Processes
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	DLC; Plasma Enhanced CVD; RF Discharges;
Description	Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties.
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