Growth temperature dependent strain in relaxed Ge microcrystals

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Authors	MEDUŇA Mojmír FALUB Claudiu Valentin ISA Fabio VON KÄNEL Hans
Year of publication	2018
Type	Article in Periodical
Magazine / Source	Thin Solid Films
MU Faculty or unit	Faculty of Science
Citation
Doi	https://doi.org/10.1016/j.tsf.2018.08.033
Keywords	Patterned substrates; Silicon substrates; Germanium; Nanocrystals; X-ray diffraction; Crystal Defects; Low energy plasma enhanced chemical vapor deposition
Description	Using high resolution X-ray diffraction with reciprocal space mapping, we obtain the lattice parameters, strain and degree of relaxation at different growth temperatures of microcrystals.
Related projects:	CEITEC - Central European Institute of Technology CEITEC - open access CEITEC Nano+ (CEITEC Nano)