Low temperature temporal and spatial atomic layer deposition of TiO2 films

• Authors: AGHAEE Morteza; MAYDANNIK Philipp; JOHANSSON Petri; KUUSIPALO Jurkka; CREATORE Mariadriana; HOMOLA Tomáš; CAMERON David Campbell
• Year of publication: 2015
• Type: Article in Periodical
• Magazine / Source: Journal of Vacuum Science & Technology A
• MU Faculty or unit: Faculty of Science
• web: http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588
• Doi: https://doi.org/10.1116/1.4922588
• Field: Solid matter physics and magnetism
• Keywords: ALD
• Description: Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants.

Related projects

• CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
• Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy