Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously

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Authors	VAŠINA Petr SCHMIDTOVÁ Tereza
Year of publication	2009
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously, proceeding
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