Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	SCHMIDTOVÁ Tereza VAŠINA Petr
Year of publication	2009
Type	Article in Proceedings
Conference	Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	modelling; magnetron
Description	Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition