Ionized physical vapor deposition by high power fast pulsed magnetron discharge

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	GANCIU Mihai VAŠINA Petr MEŠKO Marcel IMBERT Jean-Christophe DE POUCQUES Ludovic BOISSE-LAPORTE Caroline BRETAGNE Jean TOUZEAU Michel VOLDOIRE Olivier HUGON Marie-Christine AGIUS Bernard
Year of publication	2005
Type	Article in Proceedings
Conference	Actes du workshop Nouveaux oxydes a forte permittivite dans l integration des semi-conducteurs
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	pulsed magnetron discharge; IPVD
Description	Study of newly developed preionized (by low DC current) high power pulsed magnetron discharge.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Pokročilé směry ve fyzice a chemii plazmatu