Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
| Authors | |
|---|---|
| Year of publication | 2000 |
| Type | Article in Periodical |
| Magazine / Source | Diamond and Related Materials |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Carbon; Ellipsometry; Nitrides; Mechanical properties |
| Description | Nanocomposite CNx/SiO thin films |
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