Deposition of Zn-containing films using atmospheric pressure plasma jet
| Authors | |
|---|---|
| Year of publication | 2015 |
| Type | Article in Periodical |
| Magazine / Source | Open Chemistry |
| MU Faculty or unit | |
| Citation | |
| web | https://doi.org/10.1515/chem-2015-0020 |
| Doi | https://doi.org/10.1515/chem-2015-0020 |
| Field | Plasma physics |
| Keywords | Atmospheric pressure plasma jet; film deposition; zinc. |
| Description | The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed |
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