Hybrid PVD-PECVD Process and Its Application for Carbon Ritch Nanocomposite Thin Film Deposition

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	VAŠINA Petr SCHMIDTOVÁ Tereza SOUČEK Pavel BURŠÍKOVÁ Vilma
Year of publication	2012
Type	Article in Proceedings
Conference	Vrstvy a povlaky 2010: Zborník prednášok
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	hybrid PVD-PECVD; magnetron sputtering
Description	This paper dsiscusses the tybrid PVD-PECVD process and its application for carbon ritch nanocomposite thin film deposition
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev